High-NA EUV and Sculpta: Tradeoffs in Throughput and ASP

Extreme ultraviolet (EUV) lithography tools now approach $170 million per unit, with High-NA EUV projected at >$350 million per tool. Lithography accounts for roughly 35% of total process cost at ~3 nm, incentivizing alternatives that preserve scaling while reducing capital and operating expense. A recently introduced etch-side technique—pattern shaping—aims to replace portions of EUV multi-patterning on select layers. This article...